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Quartz Wafer Quartz Wafers 2", 3", 4", 6", 8", 12" SiO₂ Semiconductor Optical

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Quartz Wafer Quartz Wafers 2", 3", 4", 6", 8", 12" SiO₂ Semiconductor Optical

Brand Name : ZMSH

Model Number : Quartz Wafer

Place of Origin : China

MOQ : 25

Payment Terms : T/T

Delivery Time : 2-4 weeks

Price : 20USD

Supply Ability : By case

Packaging Details : custom cartons

Diameter (inch) : 3/4/6/8/12

Internal Transmittance : >99.9%

Refractive Index : 1.474698

Total Transmittance : >92%

TTV : <3

Flatness : <15

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Quartz Wafer Quartz Wafers 2", 3", 4", 6", 8", 12" SiO₂ Semiconductor Optical

Introduction of Quartz Wafer

Quartz wafers are made from crystalline silicon dioxide (SiO₂). The unique properties of quartz make it an essential material in various high-tech industries.

Quartz wafers exhibit excellent characteristics such as high thermal resistance, superior light transmission at specific wavelengths, chemical inertness, and a low coefficient of thermal expansion. These features make them highly suitable for applications that require stability under extreme temperatures, resistance to harsh chemicals, and transparency in specific spectral ranges.

In industries such as semiconductor manufacturing, optics, and MEMS (Micro-Electro-Mechanical Systems), quartz wafers are widely used due to their ability to withstand high temperatures without deformation or degradation. They serve as substrates for thin-film deposition, microstructure etching, or the fabrication of precision components that demand high dimensional accuracy and thermal stability.

Manufacturing Principle of Quartz Wafer

  1. Crystal Growth
    Quartz boules are grown using natural or synthetic seed crystals through hydrothermal or flame fusion (Verneuil) methods.

  2. Ingot Slicing
    Cylindrical ingots are sliced into wafers using diamond wire saws, ensuring thickness uniformity and minimal kerf loss.

  3. Lapping and Polishing
    Wafers are lapped, etched, and then polished to achieve a mirror-smooth finish with low surface roughness (Ra < 1 nm for optical-grade wafers).

  4. Cleaning & Inspection
    Ultrasonic or RCA cleaning removes particulates and metallic contaminants. Each wafer undergoes dimensional and surface flatness inspection.

Quartz Wafer Specifications

Quartz Type 4 6 8 12
Size
Diameter (inch) 4 6 8 12
Thickness (mm) 0.05–2 0.25–5 0.3–5 0.4–5
Diameter Tolerance (inch) ±0.1 ±0.1 ±0.1 ±0.1
Thickness Tolerance (mm) Customizable Customizable Customizable Customizable
Optical Properties
Refractive Index @365 nm 1.474698 1.474698 1.474698 1.474698
Refractive Index @546.1 nm 1.460243 1.460243 1.460243 1.460243
Refractive Index @1014 nm 1.450423 1.450423 1.450423 1.450423
Internal Transmittance (1250–1650 nm) >99.9% >99.9% >99.9% >99.9%
Total Transmittance (1250–1650 nm) >92% >92% >92% >92%
Machining Quality
TTV (Total Thickness Variation, µm) <3 <3 <3 <3
Flatness (µm) ≤15 ≤15 ≤15 ≤15
Surface Roughness (nm) ≤1 ≤1 ≤1 ≤1
Bow (µm) <5 <5 <5 <5
Physical Properties
Density (g/cm³) 2.20 2.20 2.20 2.20
Young's Modulus (GPa) 74.20 74.20 74.20 74.20
Mohs Hardness 6–7 6–7 6–7 6–7
Shear Modulus (GPa) 31.22 31.22 31.22 31.22
Poisson's Ratio 0.17 0.17 0.17 0.17
Compressive Strength (GPa) 1.13 1.13 1.13 1.13
Tensile Strength (MPa) 49 49 49 49
Dielectric Constant (1 MHz) 3.75 3.75 3.75 3.75
Thermal Properties
Strain Point (10¹⁴.⁵ Pa·s) 1000°C 1000°C 1000°C 1000°C
Annealing Point (10¹³ Pa·s) 1160°C 1160°C 1160°C 1160°C
Softening Point (10⁷.⁶ Pa·s) 1620°C 1620°C 1620°C 1620°C

Frequently asked questions about quartz wafers

1. What is a quartz wafer?

A quartz wafer is a thin, flat disc made from crystalline silicon dioxide (SiO₂), typically manufactured in standard semiconductor sizes (e.g., 2", 3", 4", 6", 8", or 12"). Known for its high purity, thermal stability, and optical transparency, a quartz wafer is used as a substrate or carrier in various high-precision applications such as semiconductor fabrication, MEMS devices, optical systems, and vacuum processes.

2. What is the difference between quartz and silica gel?

Quartz is a crystalline solid form of silicon dioxide (SiO₂), while silica gel is an amorphous and porous form of SiO₂, commonly used as a desiccant to absorb moisture.

  • Quartz is hard, transparent, and used in electronic, optical, and industrial applications.

  • Silica gel appears as small beads or granules and is primarily used for humidity control in packaging, electronics, and storage.

3. What are quartz crystals used for?

Quartz crystals are widely used in electronics and optics due to their piezoelectric properties (they generate an electric charge under mechanical stress). Common applications include:

  • Oscillators and frequency control (e.g., quartz watches, clocks, microcontrollers)

  • Optical components (e.g., lenses, waveplates, windows)

  • Resonators and filters in RF and communication devices

  • Sensors for pressure, acceleration, or force

  • Semiconductor fabrication as substrates or process windows

4. Why is quartz used in microchips?

Quartz is used in microchip-related applications because it offers:

  • Thermal stability during high-temperature processes like diffusion and annealing

  • Electrical insulation due to its dielectric properties

  • Chemical resistance to acids and solvents used in semiconductor fabrication

  • Dimensional precision and low thermal expansion for reliable lithography alignment
    While quartz itself isn't used as the active semiconductor material (like silicon), it plays a vital supporting role in the fabrication environment—especially in furnaces, chambers, and photomask substrates.


China Quartz Wafer Quartz Wafers 2&quot;, 3&quot;, 4&quot;, 6&quot;, 8&quot;, 12&quot; SiO₂ Semiconductor Optical wholesale

Quartz Wafer Quartz Wafers 2", 3", 4", 6", 8", 12" SiO₂ Semiconductor Optical Images

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